Abstract: Objective: This research served as the pre-study of fabricating individualized implant esthetic healing abutments. These customized abutments could be shaped on the basis of width, thickness, curvature of the cervix dentis  by measuring natural maxillary incisors. Methods: 173 natural extracted maxillary incisors were measured manually by using electronic venier caliper, including 104 central incisors and 69 lateral incisors. Mesio-distal thickness of neck, bucco-lingual width of neck, mesial and distal neck curvature, thickness and width 1.5 mm beneath the cemento-enamel junction (CEJ) were recorded. Each datum was accurate to 0.01 mm, measured three times by one person. All data were presented as the mean±standard deviation(SD). Results: The width and width 1.5 mm beneath the cemento-enamel junction (CEJ) were greater than the thickness and thickness 1.5 mm beneath the cemento-enamel junction(CEJ) of maxillary central incisors. Among the maxillary lateral incisors, while the results got reversed from  the maxillary central incisors. Conclusions: Mesial neck curvature were greater than distal neck curvature of the maxillary incisors. According to these data of the width and thickness of the maxillary incisors, the diameter and height of the healing abutments can be designed. As a result, the top of the customized abutments for maxillary incisors should be shaped in arc. The highest point of the abutment should be at the mesio-distal sides and the lowest point should be at the bucco-lingual sides.

Key words: maxillary incisors, dental implant, emergence profile, esthetic healing abutment

摘要： 目的：本研究通过测量获得天然上颌切牙牙颈部宽度、厚度及牙颈曲度等数据，为切削制作个性化愈合基台提供依据。方法：采用电子游标卡尺对173颗离体上颌切牙（中切牙104颗、侧切牙69颗）的颈部近远中宽度、颊舌向厚度，近中牙颈部曲度、远中牙颈部曲度，釉牙骨质界（CEJ）根方1.5 mm颈部宽度、颈部厚度进行测量。每部位测量3次，数据以均数±标准差（■）表示，精确到0.01 mm。结果：上颌中切牙及上颌侧切牙在颈部宽度、颈部厚度、CEJ根方1.5 mm颈部宽度与颈部厚度、近中颈曲度与远中颈曲度方面的差异均具有统计学意义（P<0.05）。上颌中切牙CEJ及CEJ根方1.5 mm颈部宽度大于颈部厚度；上颌侧切牙CEJ及CEJ根方1.5 mm颈部厚度大于颈部宽度。结论：上颌切牙基台顶端应设计为弧形，上颌中切牙、侧切牙基台近中颈部曲度应大于远中颈部曲度，近远中应为外形最高点，唇舌侧应为外形最低点。

关键词: 上颌切牙, 牙种植, 穿龈轮廓, 美学愈合基台

CLC Number: 

• R782.1